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repositories = "Qucosa" > : "3-8322-2532-3" (x)
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Herstellung, Charakterisierung und Bewertung leitfähiger Diffusionsbarrieren auf Basis von Tantal, Titan und Wolfram für die Kupfermetallisierung von Siliciumschaltkreisen Preparation, characterization and evaluation of conductive diffusion barriers based on tantalum, titanium and tungsten for the copper metallization of silicon integrated circuits

Author(s) : Dr.-Ing. Jens Baumann
Description : Summary (english): The thesis investigates the potential of thin films of Ta, Ti and W and their nitrides to suppress copper induced interactions in the contact area to silicon. Possible interactions between Cu and gaseos or solid materials within preparation and lifetime of an integrated circui...
Repository : Qucosa
Language(s) : German

Herstellung, Charakterisierung und Bewertung leitfähiger Diffusionsbarrieren auf Basis von Tantal, Titan und Wolfram für die Kupfermetallisierung von Siliciumschaltkreisen Preparation, characterization and evaluation of conductive diffusion barriers based on tantalum, titanium and tungsten for the copper metallization of silicon integrated circuits

Author(s) : Dr.-Ing. Jens Baumann
Description : The thesis investigates the potential of thin films of Ta, Ti and W and their nitrides to suppress copper induced interactions in the contact area to silicon. Possible interactions between Cu and gaseos or solid materials within preparation and lifetime of an integrated circuit are summarized. The...
Repository : Qucosa
Language(s) : German
1

Found 2 documents, displaying page 1 of 1