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HYDROGEN EVOLUTION FROM PLASMA-DEPOSITED AMORPHOUS SILICON FILMS

Author(s) : Beyer, W. , Wagner, H.
Description : The results of a systematic study of hydrogen evolution from glowdischarge a-Si : H films are presented. The influence of doping, film thickness and substrate temperature is discussed. Two evolution processes can be discerned : A low temperature effusion attributed to the release of H2 through voids...
Language(s) : English
Subject(s) : [PHYS:HIST] Physics/Physics archives
Publisher(s) :
Contributor(s) :
Source(s) : Journal de Physique Colloques
Publication Date(s) : 1981-01-01